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Introduction of Tokyo Electron and plasma developments

活动品牌 大连理工大学-学术活动
主 讲 人 Ryukichi Shimizu
活动地点 物理学院322
开始时间 2019-04-08 16:00
结束时间 2019-04-08 17:00

活动简介:

Presenter:Ryukichi Shimizu

Director - Miyagi Technology Development Center (Sendai, Japan), Sep. 2018 -

- Responsible for advanced process and hardware development of etching tool

Director - Tokyo Electron Taiwan ESBU (Hsinchu, TAIWAN), Sep. 2014 - Aug, 2018

- Responsible for research and development work of etching business in Taiwan.

- Develop manufacturable etching processes for leading-edge technology of logic device.

Director - Etch Product Development Dept. (Sendai, Japan), Nov. 2011 - Nov, 2013

- Responsible for process and product development in Logic MOL/BEOL etching for 22nm and beyond generation.

Sr. Manager - Etch Process Dept. (Albany, NY, US), May. 2007 - Jul. 2008

- Responsible for process development of FEOL and BEOL etch process for 22nm and beyond technology of IBM and alliance partner.

Presentation outline

-Overviews of Tokyo Electron and Tokyo Electron Miyagi

-Etch Process Introduction

üWhere is etch used in chip flow?

üGeneral Etching Concept

üEtch Equipment Overviews